General Info:
noel technologies specializes in prime wafer reclaim and recycling, monitor 300 mm silicon wafers, teos films, test wafers and cleaning, ultra-low partile thin films deposition, thermal oxide and semiconductor processing.
Products & Services:
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Web Site Results
Polishing FAQ Resources Contact Us PECVD PROCESS Plasma Enhanced Chemical Vapor Deposition Plasma Enhanced TEOS (TEOS Base) Thickness Tolerance Temperature Range 400A-5KA 5% 400C...
Etch to "clear". If etch stops at Si,wafers will sheet (de-wet) 800A 40A (T-Ox) 22C- 24C Pre-Mixed 7:1 BOE PECVD TEOS Etch to "clear". If etch stops at Si,wafers will sheet (de...
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