Chemicals Nanolithosolution has developed a comprehensive array of proprietary chemicals, including underlayer polymer and UV curvable photoresists. These chemicals and materials facilitate our Auto ReleaseTM imprint lithography process. Underlayer polymer: AR-ULP UV photoresist polymer: AR-UVP Mold...

Nanolithosolution provides a revolutionary one-step, Auto ReleaseTM nanoscale imprinting lithography solution with sub-20 nm resolution and accurate overlay alignment. Our technology is remarkably simple to implement; essentially any facility with microlithography capabilities can upgrade to nanosca...

Equipment Nanoimprinting module: AR-NIM-100 Our nanoimprinting module conveniently fits into a traditional aligner's wafer and mask holder. It allows precise, accurate, and complete imprinting and subsequent mold separation in one easy step. Nanoimprinting controller: AR-IMC-100 Nanolithosolution's ...

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Nanolithosolution provides a revolutionary one-step, Auto ReleaseTM nanoscale imprinting lithography solution with sub-20 nm resolution and accurate overlay alignment. Our technology is remarkably simple to implement; essentially any facility with microlithography capabilities can upgrade to nanosca...